Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
source de pulvérisation ionique — dulkinamasis jonų šaltinis statusas T sritis radioelektronika atitikmenys: angl. ion sputtering source vok. Ionensputterquelle, f rus. источник для ионного распыления, m pranc. source de pulvérisation ionique, f … Radioelektronikos terminų žodynas
Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… … Wikipedia
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… … Wikipedia
Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Pulvérisation cathodique (sputtering) — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Static secondary ion mass spectrometry — Static secondary ion mass spectrometry, or static SIMS is a technique for chemical analysis including elemental composition and chemical structure of the uppermost atomic or molecular layer of a solid which may be a metal, semiconductor or… … Wikipedia
Secondary ion mass spectrometry — Infobox chemical analysis name = Secondary ion mass spectrometry caption =CAMECA IMS3f Magnetic SIMS Instrument acronym = SIMS classification =Mass spectrometry analytes = Solid surfaces, thin films related = Fast atom bombardment… … Wikipedia
Low-energy ion scattering — LEIS redirects here; for the Hawaiian garland see Lei (Hawaii). Low energy ion scattering spectroscopy (LEIS), sometimes referred to simply as ion scattering spectroscopy (ISS), is a surface sensitive analytical technique used to characterize the … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
